The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2006
Filed:
Feb. 25, 2004
Applicants:
Michael D. Jines, Northfield, MN (US);
Michael Smedstad, Owatonna, MN (US);
Steven E. Wiese, Owatonna, MN (US);
Inventors:
Michael D. Jines, Northfield, MN (US);
Michael Smedstad, Owatonna, MN (US);
Steven E. Wiese, Owatonna, MN (US);
Assignee:
Wenger Corporation, Owatonna, MN (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F21V 33/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A make up station provides even illumination for a performer's face while minimizing glare and distracting reflections. The make up station is modular to allow the easy assembly of multiple make up stations partially sharing common lighting between adjacent stations. Light rays emanating from the forward most edge of a light source are blocked by a raised trim or reflected from the mirror surface in a direction so that they do not impinge on the user's eye.