The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2006
Filed:
Mar. 17, 2003
Victor Alexandrovich Kalinin, Oxford, GB;
Mark Lee, Totton, GB;
Raymond David Lohr, Long Crendon, GB;
Arthur John Leigh, Banbury, GB;
Victor Alexandrovich Kalinin, Oxford, GB;
Mark Lee, Totton, GB;
Raymond David Lohr, Long Crendon, GB;
Arthur John Leigh, Banbury, GB;
Transense Technologies PLC, , GB;
Abstract
A pressure monitor has a base and a lid secured to the base to define a substantially fluid tight chamber. At least part of the lid is flexible and forms a diaphragm which deflects responsive to changes in fluid pressure surrounding the monitor. A projection provided on the diaphragm transmits movement thereof to a distortable substrate located within the chamber. A first SAW device is mounted on the distortable substrate, and at least a second and third SAW device are mounted within the chamber. The second SAW device carried on a reference substrate section has its direction of propagation inclined at an angle to the direction of propagation of at least one of the first and third SAW devices. This way movement of the diaphragm induced by a change in pressure in the zone surrounding the monitor results in distortion of the distortable substrate, which is measurable by the SAW device mounted thereon, without distorting said reference substrate section.