The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2006
Filed:
Mar. 07, 2001
H. Sam Bergh, San Francisco, CA (US);
James R. Engstrom, Ithaca, NY (US);
Shenheng Guan, Palo Alto, CA (US);
Daniel Meron Pinkas, Alameda, CA (US);
Kyle W. Self, San Jose, CA (US);
H. Sam Bergh, San Francisco, CA (US);
James R. Engstrom, Ithaca, NY (US);
Shenheng Guan, Palo Alto, CA (US);
Daniel Meron Pinkas, Alameda, CA (US);
Kyle W. Self, San Jose, CA (US);
Symyx Technologies, Inc., Santa Clara, CA (US);
Abstract
Parallel flow reaction systems comprising four or more reaction channels are disclosed. Distribution systems, and parallel flow reaction systems comprising such distribution systems are also disclosed. Specifically, the distribution systems comprise one or more subsystems, including for example, a flow-partitioning subsystem for providing a different flow rate to each of the four or more reactors, a pressure-partitioning subsystem for providing a different reaction pressure in the reaction cavity of each of the four or more reactors, and a feed-composition subsystem for providing a different feed composition to each of the four or more reactors. In preferred embodiments, the one or more subsystems can comprise at least one set of four or more flow restrictors, each of the four or more flow restrictors having a flow resistance that varies relative to other flow restrictors in the set.