The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2006
Filed:
Feb. 27, 2004
Min Ho Jung, Kyoungki-do, KR;
Sung Eun Hong, Kyoungki-do, KR;
Jae Chang Jung, Kyoungki-do, KR;
Geun Su Lee, Kyoungki-do, KR;
Ki Ho Baik, Kyoungki-do, KR;
Min Ho Jung, Kyoungki-do, KR;
Sung Eun Hong, Kyoungki-do, KR;
Jae Chang Jung, Kyoungki-do, KR;
Geun Su Lee, Kyoungki-do, KR;
Ki Ho Baik, Kyoungki-do, KR;
Hynix Semiconductor Inc., Kyungki-do, KR;
Abstract
The present invention provides an additive for a photoresist composition for a resist flow process. A compound of following Formula 1 having low glass transition temperature is added to a photoresist composition containing a polymer which is not suitable for the resist flow process due to its high glass transition temperature, thus improving a flow property of the photoresist composition. As a result, the photoresist composition comprising an additive of Formula 1 can be used for the resist flow process. wherein, A, B, R and R' are as defined in the specification of the invention.