The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 19, 2006

Filed:

Jun. 12, 2003
Applicants:

Meng H. Lean, Santa Clara, CA (US);

Huangpin Ben Hsieh, Mountain View, CA (US);

John S. Fitch, Los Altos, CA (US);

Armin R. Völkel, Mountain View, CA (US);

Bryan Preas, Palo Alto, CA (US);

Scott Elrod, La Honda, CA (US);

Richard H. Bruce, Los Altos, CA (US);

Eric Peeters, Fremont, CA (US);

Frank Torres, San Jose, CA (US);

Michael Chabinyc, Mountain View, CA (US);

Inventors:

Meng H. Lean, Santa Clara, CA (US);

Huangpin Ben Hsieh, Mountain View, CA (US);

John S. Fitch, Los Altos, CA (US);

Armin R. Völkel, Mountain View, CA (US);

Bryan Preas, Palo Alto, CA (US);

Scott Elrod, La Honda, CA (US);

Richard H. Bruce, Los Altos, CA (US);

Eric Peeters, Fremont, CA (US);

Frank Torres, San Jose, CA (US);

Michael Chabinyc, Mountain View, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 57/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

Various gel electrophoretic assemblies and techniques are disclosed for providing unique isoelectric focusing (IEF) strategies. Several particular systems, assemblies and methods are provided that significantly reduce processing time, enable the use of reduced operating voltages, and produce analytical results with improved resolution.


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