The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2006
Filed:
May. 15, 2006
Applicant:
Yoshinori Ohsaki, Tochigi, JP;
Inventor:
Yoshinori Ohsaki, Tochigi, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed is an exposure method in which high precision focus calibration is realized by measuring a tilt of an image plane in a scanning direction, so that exposure with a high resolution can be performed. The exposure method includes: a measuring step of measuring a position of an image plane of a projection optical system at a plurality of measurement positions different from each other with respect to a scanning direction; and a correcting step of correcting a tilt of the image plane of the projection optical system based on measurements.