The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2006
Filed:
Jan. 16, 2006
Jonathan S. Ehrmann, Sudbury, MA (US);
James J. Cordingley, Littleton, MA (US);
Donald V. Smart, Boston, MA (US);
Donald J. Svetkoff, Ann Arbor, MI (US);
Jonathan S. Ehrmann, Sudbury, MA (US);
James J. Cordingley, Littleton, MA (US);
Donald V. Smart, Boston, MA (US);
Donald J. Svetkoff, Ann Arbor, MI (US);
GSI Group Corporation, Billerica, MA (US);
Abstract
A precision, laser-based method and system for high-speed, sequential processing of material of targets within a field are disclosed that control the irradiation distribution pattern of imaged spots. For each spot, a laser beam is incident on a first anamorphic optical device and a second anamorphic optical device so that the beam is controllably modified into an elliptical irradiance pattern. The modified beam is propagated through a scanning optical system with an objective lens to image a controlled elliptical spot on the target. In one embodiment, the relative orientations of the devices along an optical axis are controlled to modify the beam irradiance pattern to obtain an elliptical shape while the absolute orientation of the devices controls the orientation of the elliptical spot.