The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2006
Filed:
Jul. 14, 2004
Applicants:
BO LI, Campbell, CA (US);
Victor LU, Santa Cruz, CA (US);
Paul G. Apen, San Jose, CA (US);
Roger Y. Leung, San Jose, CA (US);
Inventors:
Bo Li, Campbell, CA (US);
Victor Lu, Santa Cruz, CA (US);
Paul G. Apen, San Jose, CA (US);
Roger Y. Leung, San Jose, CA (US);
Assignee:
Honeywell International Inc., Morristown, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 11/04 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of producing a nanoporous silica dielectric film having improved mechanical strength. A composition is formed which comprises in admixture a porogen, a solvent, a catalyst and a combination of silicon containing pre-polymers.