The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 12, 2006

Filed:

Jul. 10, 2003
Applicants:

László Vígh, Szeged, HU;

Péter Literáti Nagy, Budapest, HU;

Jenó Szilbereky, Budapest, HU;

László Ürögdi, Budapest, HU;

Andrea Jednákovits, Budapest, HU;

László Jaszlits, Budapest, HU;

Katalin Bíró, Budapest, HU;

Ede Márványos, Budapest, HU;

Mihály Barabás, Budapest, HU;

Erzsébet Hegedüs, Budapesst, HU;

László Korányi, Budapest, HU;

Mária Kürthy, Budapest, HU;

Gábor Balogh, Szeged, HU;

Ibolya Horváth, Szeged, HU;

Zsolt Török, Szeged, HU;

Éva Udvardy, Budapest, HU;

György Dormán, Budapest, HU;

Dénes Medzihradszky, Budapest, HU;

Bea Mézes, Budapest, HU;

Eszter Kovács, Szeged, HU;

Ernó Duda, Budapest, HU;

Beatrix Farkas, Szeged, HU;

Attila Glatz, Szeged, HU;

Inventors:

László Vígh, Szeged, HU;

Péter Literáti Nagy, Budapest, HU;

Jenó Szilbereky, Budapest, HU;

László Ürögdi, Budapest, HU;

Andrea Jednákovits, Budapest, HU;

László Jaszlits, Budapest, HU;

Katalin Bíró, Budapest, HU;

Ede Márványos, Budapest, HU;

Mihály Barabás, Budapest, HU;

Erzsébet Hegedüs, Budapesst, HU;

László Korányi, Budapest, HU;

Mária Kürthy, Budapest, HU;

Gábor Balogh, Szeged, HU;

Ibolya Horváth, Szeged, HU;

Zsolt Török, Szeged, HU;

Éva Udvardy, Budapest, HU;

György Dormán, Budapest, HU;

Dénes Medzihradszky, Budapest, HU;

Bea Mézes, Budapest, HU;

Eszter Kovács, Szeged, HU;

Ernó Duda, Budapest, HU;

Beatrix Farkas, Szeged, HU;

Attila Glatz, Szeged, HU;

Assignee:

CytRx Corporation, Los Angeles, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H63K 31/44 (2006.01); C07C 259/02 (2006.01); C07D 213/78 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of increasing expression of a molecular chaperon by a cell and/or enhancing the activity of a molecular chaperon in cells is provided. The method comprises treating a cell that is exposed to a physiological stress which induces expression of a molecular chaperon by the cell with an effective amount of a certain hydroxylamine derivative to increase the stress. Alternatively, an hydroxylamine derivative can be administrated to a cell before it is exposed to a physiological stress which induces expression of a molecular chaperon by the cell. Preferably, the cell to which an hydroxylamine derivative is administered is an eukaryotic cell. The hydroxylamine derivative corresponds to the formulae (I) or (II). The invention also provides novel hydroxylamine derivatives falling within the scope of the formulae (I) and (II) as well as pharmaceutical and/or cosmetical compositions comprising the said compounds.


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