The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 12, 2006

Filed:

Oct. 19, 2004
Applicants:

Matthias Fuertsch, Gomaringen, DE;

Stefan Pinter, Reutlingen, DE;

Heribert Weber, Nuertingen, DE;

Frank Fischer, Gomaringen, DE;

Lars Metzger, Moessingen-Belsen, DE;

Christoph Schelling, Reutlingen, DE;

Frieder Sundermeier, Kornwestheim, DE;

Inventors:

Matthias Fuertsch, Gomaringen, DE;

Stefan Pinter, Reutlingen, DE;

Heribert Weber, Nuertingen, DE;

Frank Fischer, Gomaringen, DE;

Lars Metzger, Moessingen-Belsen, DE;

Christoph Schelling, Reutlingen, DE;

Frieder Sundermeier, Kornwestheim, DE;

Assignee:

Robert Bosch GmbH, Stuttgart, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A micromechanical structural element, having a very stable diaphragm, implemented in a pure front process and in a layer construction on a substrate. The layer construction includes at least one sacrificial layer and one diaphragm layer above the sacrificial layer, which is structured for laying bare the diaphragm and generating stabilizing elements on the diaphragm, at least one recess being generated for a stabilizing element of the diaphragm. The structure generated in the sacrificial layer is then at least superficially closed with at least one material layer being deposited above the structured sacrificial layer, this material layer forming at least a part of the diaphragm layer and being structured to generate at least one etch hole for etching the sacrificial layer, which is removed from the region under the etch hole, the diaphragm and the at least one stabilizing element being laid bare, a cavity being created under the diaphragm.


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