The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2006
Filed:
Sep. 15, 2003
Catherine A. Morley, Lester Prairie, MN (US);
Mark P. Sponholz, Minneapolis, MN (US);
Steven R. Young, Hutchinson, MN (US);
Steven A. Fank, Darwin, MN (US);
Jacob D. Bjorstrom, Hutchinson, MN (US);
Catherine A. Morley, Lester Prairie, MN (US);
Mark P. Sponholz, Minneapolis, MN (US);
Steven R. Young, Hutchinson, MN (US);
Steven A. Fank, Darwin, MN (US);
Jacob D. Bjorstrom, Hutchinson, MN (US);
Hutchinson Technology Incorporated, Hutchinson, MN (US);
Abstract
The present invention provides a process for controlling the contour of a feature in a transition area made by etching a substrate. This process includes applying a patterned resist mask to the substrate to form a plurality of mask openings and mask land areas. The mask land areas are sized and spaced to a control the contour of a feature on the substrate.