The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2006
Filed:
Jan. 22, 2001
Panayotis Cocolios, Bullion, FR;
François Coeuret, Guyancourt, FR;
Franck Forster, Hamburg, DE;
Jean-louis Gelot, Elancourt, FR;
Bernd Martens, Hamburg, DE;
Eckhard Prinz, Hamburg, DE;
Géraldine Rames-langlade, Chaville, FR;
Alain Villermet, Viroflay, FR;
Panayotis Cocolios, Bullion, FR;
François Coeuret, Guyancourt, FR;
Franck Forster, Hamburg, DE;
Jean-Louis Gelot, Elancourt, FR;
Bernd Martens, Hamburg, DE;
Eckhard Prinz, Hamburg, DE;
Géraldine Rames-Langlade, Chaville, FR;
Alain Villermet, Viroflay, FR;
Abstract
Methods for treating polymeric substrates by placing the substrate in a gaseous mixture and subjecting it to a dielectric barrier electrical discharge. The gaseous mixture, which has a pressure around atmospheric, contains a carrier gas, a reducing gas and an oxidizing gas. The amount of the oxidizing gas in the gas mixture is between about 50 ppm and about 2000 ppm by volume, while the amount of the reducing gas in the gas mixture is between about 50 ppm and 30000 ppm by volume.