The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2006
Filed:
Mar. 24, 2003
Tomoyuki Okada, Kawasaki, JP;
Seiji Makino, Kawasaki, JP;
Kouichi Suzuki, Kawasaki, JP;
Takahisa Ito, Kawasaki, JP;
Tomoyuki Okada, Kawasaki, JP;
Seiji Makino, Kawasaki, JP;
Kouichi Suzuki, Kawasaki, JP;
Takahisa Ito, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A pattern image comparison method is provided which comprises a first input step of inputting a first pattern image based on design data for a reticle mask or a semiconductor device; a second input step of inputting a second pattern image of the reticle mask or semiconductor device manufactured based on the design data; a calculation step of calculating at least one parameter of parameters including a part or all of area, outer periphery, barycenter, and diagonal line of the first pattern image and the second pattern image; and an output step of outputting a result of comparison of a pattern on the reticle mask or semiconductor device and a pattern of the design data based on the calculated parameters of the first and second pattern images.