The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2006
Filed:
Aug. 07, 2003
Applicants:
Haruko Akutsu, Yokosuka, JP;
Katsumi Rikimaru, Yokohama, JP;
Kyoichi Suguro, Yokohama, JP;
Tatsuya Shima, Yokohama, JP;
Yoshimasa Kawase, Yokohama, JP;
Atsushi Murakoshi, Oita, JP;
Inventors:
Haruko Akutsu, Yokosuka, JP;
Katsumi Rikimaru, Yokohama, JP;
Kyoichi Suguro, Yokohama, JP;
Tatsuya Shima, Yokohama, JP;
Yoshimasa Kawase, Yokohama, JP;
Atsushi Murakoshi, Oita, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/41 (2006.01);
U.S. Cl.
CPC ...
Abstract
An apparatus for evaluating semiconductor material having a pump laser configured to irradiate a pump beam modulated at a modulation frequency on a semiconductor wafer, a probe laser configured to irradiate a probe beam on the semiconductor wafer, and a detector configured to detect a reflection of the probe beam from the semiconductor wafer.