The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2006
Filed:
Jun. 09, 2000
Michael K. Templeton, Atherton, CA (US);
Bharath Rangarajan, Santa Clara, CA (US);
Michael K. Templeton, Atherton, CA (US);
Bharath Rangarajan, Santa Clara, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A system and method is provided for monitoring and controlling the contaminant particle count contained in an aerosol during a photoresist coating and/or development process of a semiconductor. The monitoring system monitors the contaminate particle count present in the environment of the photoresist coating and/or development process, such as in a process chamber or a cup, enclosing the wafer during the process. The present invention employs in situ laser scattering or laser doppler anemometry techniques to detect the particle count level in the chamber or cup. A plurality of lasers and detectors can be positioned at different heights in or outside of a chamber or cup to facilitate detecting particles at different height levels. A laser could be used in conjunction with mirrors to provide a similar measurement. The particle count level can be used to compare with the defect level, so that it can be determined if a cleaner environment and/or process should be implemented.