The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 2006

Filed:

Apr. 25, 2005
Applicants:

Hiromi Ishikawa, Kanagawa-ken, JP;

Masahiro Ohba, Kanagawa-ken, JP;

Norihasa Takada, Kanagawa-ken, JP;

Yutaka Korogi, Kanagawa-ken, JP;

Inventors:

Hiromi Ishikawa, Kanagawa-ken, JP;

Masahiro Ohba, Kanagawa-ken, JP;

Norihasa Takada, Kanagawa-ken, JP;

Yutaka Korogi, Kanagawa-ken, JP;

Assignee:

Fuji Photo Film Co., Ltd., Kanagawa-ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

A spatial light modulating method performs spatial light modulation of light produced by a light source. The method includes forming an image of a two-dimensional pattern of the light, which has been obtained from the spatial light modulation, on a photosensitive material, using an image-sided telecentric optical system. The method further includes altering an axial air separation, upstream of the photosensitive material, to thereby adjust a focusing point at the time of the formation of the image of the two-dimensional pattern of the light.


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