The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2006
Filed:
Jan. 09, 2003
Ikuo Nishimoto, Kanagawa, JP;
Nobuo Takeda, Miyagi, JP;
Ichitaroh Satoh, Tokyo, JP;
Yamatake Corporation, Tokyo, JP;
Abstract
A semiconductor manufacturing station () exposes light on a surface area of a spherical semiconductor device or ball (). A mask pattern generator () provides a pattern of light, which undergoes temporal changes to collectively represent an image. The mask pattern generator has an active exposure contour () that provides a portion of the overall image. The pattern of light is directed though a lens () to the surface area of the semiconductor device. The semiconductor device rotates in relation to the temporal changes in the pattern of light to expose the pattern of light over a portion of a surface area of the semiconductor device. The exposure contour has a narrower center and becomes wider moving away from the center. The exposure contour may have a curvature.