The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2006
Filed:
Feb. 20, 2002
Dong-ki Lee, Seoul, KR;
Sung-chul Kang, Seongnam, KR;
You-kyoung Lee, Suwon, KR;
Jin-ho Ju, Seoul, KR;
Dong-Ki Lee, Seoul, KR;
Sung-Chul Kang, Seongnam, KR;
You-Kyoung Lee, Suwon, KR;
Jin-Ho Ju, Seoul, KR;
Abstract
The present invention relates to a photoresist composition having high heat resistance used in the production process of an LCD, and more particularly, to a photoresist composition having high heat resistance, capable of decreasing process tact (a way), of process simplification, and of the retrenchment of expenditures. The inventive composition facilitates this through making it possible to skip 5 processes, such as Cr metal deposition forming a metal film, and the photo/etch/PR strip/etch steps of the whole surface of the metal, by substituting the inventive composition for the usual metal film, such that Nion doping in production of TFT-LCD can take place due its high heat resistance.