The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2006
Filed:
Dec. 21, 2005
Kenji Kamimura, Yokohama, JP;
Satoru Asai, Yokohama, JP;
Satoru Yanaka, Yokosuka, JP;
Ryusuke Tsuboi, Yokohama, JP;
Tadashi Tanuma, Yokohama, JP;
Masataka Kikuchi, Chigasaki, JP;
Kenji Kamimura, Yokohama, JP;
Satoru Asai, Yokohama, JP;
Satoru Yanaka, Yokosuka, JP;
Ryusuke Tsuboi, Yokohama, JP;
Tadashi Tanuma, Yokohama, JP;
Masataka Kikuchi, Chigasaki, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A surface to be polished of a large part is polished by projecting and colliding an abrasive comprising abrasive grains and an elastic petrochemical high polymer material having the specific gravity of 0.5 to 1.8 g/cmand elasticity of 10 to 200 ckg/cmor an elastic natural material, to the surface to be polished of the large part at a speed of 600 m to 3800 m per minute and by a volume of 5 to 300 cc/cm·sec per unit area, and sliding the abrasive.