The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 28, 2006

Filed:

Jun. 09, 2004
Applicant:

Duan-fan Wang, Hillsborough, NJ (US);

Inventor:

Duan-Fan Wang, Hillsborough, NJ (US);

Assignee:

Cabot Corporation, Boston, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01G 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods of forming tantalum powders and other valve metal powders are described. The method involves high impact milling a starting powder in a fluid medium and optionally a milling media using a high energy mill. The methods of the present invention have the ability to reduce DC leakage and/or increase capacitance capabilities of valve metal powders when formed into capacitor anodes. The methods of present invention further reduce the milling time necessary to form high surface area valve metal powders and leads to reducing contaminant levels in the valve metal powders. The process is particularly well-suited for forming metal flakes, such as tantalum or niobium flakes, of high purity.


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