The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2006
Filed:
Nov. 19, 2003
Kuniaki Okada, Tenri, JP;
Minoru Ueda, Tenri, JP;
Kuniaki Okada, Tenri, JP;
Minoru Ueda, Tenri, JP;
Sharp Kabushiki Kaisha, , JP;
Abstract
Provided is a method of manufacturing a microlens substrate capable of facilitating optical axis alignment and simplifying manufacturing processes by patterning a lens shape of a second microlens array using a first microlens array. The lens shape of the cylindrical second microlens array is patterned by irradiating the first microlens array with ultraviolet rays. Light emitted from a linear light source which is variable in its position is imaged on a focal surface of the first microlens array by a collimator lens and the first microlens array, and a resist layer formed by being coated on the focal surface is exposed. By performing exposure while changing the position of the linear light source, a resist pattern of a desired cylindrical shape can be obtained. Thereafter, etching is performed to transfer the shape of the resist pattern onto an intermediate glass layer, and recesses are buried with a high refractive index UV curable resin.