The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2006
Filed:
Sep. 18, 2002
Young-mi Tak, Seoul, KR;
Woon-yong Park, Suwon, KR;
Kwon-young Choi, Seoul, KR;
Myung-jae Park, Gwangju, KR;
Young-Mi Tak, Seoul, KR;
Woon-Yong Park, Suwon, KR;
Kwon-Young Choi, Seoul, KR;
Myung-Jae Park, Gwangju, KR;
Abstract
In a method of manufacturing a liquid crystal display using a divisional exposure for a substrate, an overlapping area at the boundary between adjacent shots is provided and the shots left and right to the boundary are exposed in a way that the areas of the shots gradually decreases and gradually increases, respectively, to reduce the brightness difference due to stitch errors between the two shots. For example, the number of unit stitch areas assigned to the left gradually decreases and the number of unit stitch areas assigned to the right shot gradually increases as it goes to the right along the transverse direction in the stitch area. A unit stitch includes an area obtained by dividing a pixel into at least two parts.