The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2006
Filed:
Nov. 30, 2004
Kazunobu Ohkubo, Kanagawa, JP;
Hiroaki Hyuga, Kanagawa, JP;
Kazunobu Ohkubo, Kanagawa, JP;
Hiroaki Hyuga, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
An exposure apparatus includes a light emitting device array in which a plurality of light emitting devices comprising light emitting sections formed onto a transparent substrate with a predetermined pattern and capable of being controlled and driven independently are arranged in a primary scanning direction to form a device row and a plurality of the device rows are arranged in a secondary scanning direction intersecting with the primary scanning direction. Further, the plurality of light emitting devices are aligned in the secondary direction with respect to a photosensitive material, and the plurality of device rows are sequentially illuminated on a time-division basis. In particular, the plurality of device rows are arranged with a pitch T expressed by T=(m−1/n)P when they are sequentially illuminated in a direction identical to the secondary scanning direction, and are arranged with a pitch T expressed by T=(m+1/n)P when they are sequentially illuminated in a direction opposite to the secondary scanning direction, where P is the pitch of an exposure pixel, m is an integer equal to or greater than 2, and n is the number of device rows arranged in the secondary scanning direction.