The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2006
Filed:
Jun. 03, 2004
Akihiro Fujiwara, Kitakyushu, JP;
Shoji Hiramatsu, Onga-gun, JP;
Akihiro Fujiwara, Kitakyushu, JP;
Shoji Hiramatsu, Onga-gun, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
An MOCVD apparatus includes a raw material supply section configured to supply a process raw material into a process chamber. The raw material supply section includes a bubbling unit that stores an organic metal raw material in a liquid state. A carrier gas line is configured to supply, into the bubbling unit, a carrier gas that causes the organic metal raw material in a liquid state to bubble up. A flow rate control portion is provided on the carrier gas line to control the carrier gas flow rate. The flow rate control portion includes a plurality of mass flow controllers, which are disposed in parallel with each other and have full-scales different from each other for flow rate control. The mass flow controllers are switched for use, in accordance with the carrier gas flow rate.