The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 28, 2006

Filed:

Dec. 26, 2003
Applicants:

Koji Fujimoto, Tokyo, JP;

Atsushi Onodera, Tokyo, JP;

Jun Ohashi, Tokyo, JP;

Motoki Numata, Fukuoka, JP;

Takayuki Isogai, Fukuoka, JP;

Katsunori Fukuda, Fukuoka, JP;

Inventors:

Koji Fujimoto, Tokyo, JP;

Atsushi Onodera, Tokyo, JP;

Jun Ohashi, Tokyo, JP;

Motoki Numata, Fukuoka, JP;

Takayuki Isogai, Fukuoka, JP;

Katsunori Fukuda, Fukuoka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B04B 3/04 (2006.01); B01D 33/06 (2006.01); B01D 33/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

A screen bowl type centrifugal separator which can not only eliminate the problem of the productivity being lowered resulting from the occurrence of clogging with the crystals in the screen part, but also minimize the amount of leakage of the object to be treated in the screen part. Inside of the hub () of the screw conveyor (), a cleaning liquid receiving part () which receives the cleaning liquid for the cleaning nozzle () is provided, and further, in the cleaning liquid receiving part (), a residual layer crystal cleaning liquid receiving part () which receives the cleaning liquid for cleaning the residual layer object to be treated in the screen part () is provided, being partitioned independently of the inside of the cleaning liquid receiving part (). The cleaning liquid which has been supplied to the inside of the residual layer crystal cleaning liquid receiving part () is jet spouted directly toward the residual layer object to be treated from the outer circumferential edge of the flight () through the residual layer crystal cleaning liquid path provided along the direction of the helix of the flight (), with no relation to said cleaning liquid receiving part ().


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