The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2006
Filed:
Nov. 09, 2004
Koichiro Aono, Shizuoka-ken, JP;
Fumikazu Kobayashi, Shizuoka-ken, JP;
Koichiro Aono, Shizuoka-ken, JP;
Fumikazu Kobayashi, Shizuoka-ken, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A method for evaluating planographic printing plates according to the present invention includes: a step (A) of exposing a planographic printing plate precursor by irradiating a thin-line image of a one-pixel line and at least one thin-line image selected from two- to eight-pixel lines by incrementally altering the plate-surface energy; developing the exposed plate precursor with a standard developer; and identifying an exposure intensity (hereinafter, 'thin-line sensitivity') that respectively provides the images thus formed, with the same density; a step (B) of preparing another planographic printing plate precursor under the same conditions as in the step (A) and identifying the thin-line sensitivity, except that the planographic printing plate precursor is developed with a test developer; a step (C) of comparing the thin-line sensitivities respectively obtained in the steps (A) and (B); and a step (D) of adjusting plate-making conditions when the results of the comparison in the step (C) show a difference between the respective thin-line sensitivities that exceeds a predetermined value.