The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2006
Filed:
May. 11, 2004
Irfan Rahim, San Jose, CA (US);
Bradley Jensen, San Jose, CA (US);
Girish Venkitachalam, San Jose, CA (US);
Hugh Sung-ki O, Fremont, CA (US);
Susan Falk, Los Altos, CA (US);
Priya Selvaraj, Sunnyvale, CA (US);
Irfan Rahim, San Jose, CA (US);
Bradley Jensen, San Jose, CA (US);
Girish Venkitachalam, San Jose, CA (US);
Hugh Sung-Ki O, Fremont, CA (US);
Susan Falk, Los Altos, CA (US);
Priya Selvaraj, Sunnyvale, CA (US);
Altera Corporation, San Jose, CA (US);
Abstract
Disclosed is a method for checking the operation of an IC mask generation algorithm in which at least a first identifier of the mask generation algorithm is associated with at least a first symbol that is not associated with generating a functional IC feature. The first symbol has a predetermined size and a predetermined shape. A predetermined location on a mask is also associated with the first symbol. A mask diagram on the mask is generated at least partially at the first predetermined location. The size and shape of the mask diagram is then compared with at least a portion of the first predetermined size and the first predetermined shape of the first symbol.