The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2006
Filed:
May. 30, 2002
Toshihiro Kuroda, Ibaraki, JP;
Madoka Kondou, Ibaraki, JP;
Atsushi Yoshino, Ibaraki, JP;
Nobuo Miyadera, Ibaraki, JP;
Toshihiro Kuroda, Ibaraki, JP;
Madoka Kondou, Ibaraki, JP;
Atsushi Yoshino, Ibaraki, JP;
Nobuo Miyadera, Ibaraki, JP;
Hitachi Chemical Company, Ltd., Tokyo, JP;
Abstract
A method of producing optical elements using a substrate having a recess, which is capable of easily removing a film in the recess, and optical elements formed. The optical element comprises a substrate, an optical waveguide structure layerof resin disposed in a part of the region on the substrate, and a recessformed in the region where the optical waveguide structure layeris not disposed. The optical waveguide structure layerincludes an optical waveguideand a clad layer. A coupler layer is disposed between the substrateand the optical waveguide structure layer, and the film thickness distribution range of the coupler layer in the region below the optical waveguideis such that the minimum film thickness is not more than 30 angstroms and the maximum film thickness is not less than 20 angstroms.