The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2006
Filed:
Nov. 13, 2003
Applicants:
Stanislav Kadlec, Buchs, CH;
Eduard Kügler, Feldkirch-Tisis, AT;
Thomas Halter, Sennwald, CH;
Inventors:
Assignee:
OC Oerlikon Balzers AG, Balzers, LI;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/26 (2006.01);
U.S. Cl.
CPC ...
Abstract
In order to produce substrate surfaces with a given two-dimensional surface distribution arising from a treatment using a vacuum treatment process, an inhomogeneous plasma () with a density distribution is generated and moved relative to the substrate () with a given movement.
Kadlec, Stanislav. (2006). Method of producing a substrate with a surface treated by a vacuum treatment process, use of said method for the production of coated workpieces and plasma treatment chamber (U.S. Patent No. 7138343). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7138343
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