The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 2006

Filed:

Jul. 29, 2002
Applicants:

Min Zheng, Milpitas, CA (US);

Gunn Choe, San Jose, CA (US);

Inventors:

Min Zheng, Milpitas, CA (US);

Gunn Choe, San Jose, CA (US);

Assignee:

Maxtor Corporation, Longmont, CO (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/66 (2006.01); G11B 5/70 (2006.01);
U.S. Cl.
CPC ...
Abstract

A perpendicular magnetic recording medium having good perpendicular magnetic anisotropy. The magnetic recording medium includes a tantalum (Ta) seedlayer and a ruthenium (Ru) underlayer. The magnetic recording layer can be fabricated from cobalt (Co) alloys. With the Ta seedlayer, the perpendicular anisotropy and c-axis orientation of the magnetic recording layer are greatly enhanced. Unity squareness is achievable as is a negative nucleation field. The magnetic recording medium can be formed by sputtering the various layers onto a substrate. Thus, a perpendicular magnetic recording medium suitable for mass production is provided.


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