The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2006
Filed:
Jun. 21, 2002
Kiyoshi Arita, Fukuoka, JP;
Tetsuhiro Iwai, Kasuga, JP;
Hiroshi Haji, Chikushino, JP;
Shoji Sakemi, Ogoori, JP;
Taiji Matano, Kitakyushu, JP;
Nobuhiro Satou, Kitakyushu, JP;
Kiyoshi Arita, Fukuoka, JP;
Tetsuhiro Iwai, Kasuga, JP;
Hiroshi Haji, Chikushino, JP;
Shoji Sakemi, Ogoori, JP;
Taiji Matano, Kitakyushu, JP;
Nobuhiro Satou, Kitakyushu, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Krosaki Harima Corporation, Fukuoka, JP;
Abstract
In a plasma treating apparatus, a ceramic porous substance having a three-dimensional network structure in which a frame portion formed of ceramic containing alumina is provided continuously like a three-dimensional network is used for the material of an electrode member for the plasma treating apparatus to be attached to the front surface of a gas supplying port of an electrode for plasma generation, and a gas for plasma generation is caused to pass through a hole portion formed irregularly in the three-dimensional network structure. Consequently, the distribution of the gas to be supplied is made uniform to prevent an abnormal discharge so that uniform etching having no variation can be carried out.