The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2006
Filed:
Mar. 12, 2003
Applicant:
Takakuni Ueno, Tokyo, JP;
Inventor:
Takakuni Ueno, Tokyo, JP;
Assignee:
Teijin Seiki Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B28B 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A stereolithographic method which comprises irradiating the surface of a photohardenable resin composition with light through an image drawing mask capable of changing its mask image with the image drawing mask being moved in parallel to the surface of the photohardenable resin composition and the mask image of the image drawing mask being changed in synchronism with the movement of the image drawing mask according to the sectional shape pattern on the photohardened resin layer to be formed to form a photohardened resin layer having a predetermined sectional shape pattern and a stereolithographic apparatus therefor.