The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2006
Filed:
Apr. 12, 2001
Sarah F. Frisken, Cambridge, MA (US);
Ronald N. Perry, Cambridge, MA (US);
Sarah F. Frisken, Cambridge, MA (US);
Ronald N. Perry, Cambridge, MA (US);
Mitsubishi Electric Research Laboratories, Inc., Cambridge, MA (US);
Abstract
A method is described for modeling interactions between models. A first adaptively sampled distance field having a first spatial hierarchy for a first model is generated, and a second adaptively sampled distance field having a second spatial hierarchy for a second model is generated. During each time step, a potential overlap region is determined using the spatial hierarchies of the first and second adaptively sampled distance fields. When the potential overlap region is non-empty, a third adaptively sampled distance field is generated from the first and second adaptively sampled distance fields using a first interaction procedure and first properties and a fourth adaptively sampled distance field is generated from the first and second adaptively distance fields using a second interaction procedure and second properties to model the interactions between the first and second models.