The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2006
Filed:
Aug. 04, 2003
Shin-ichi Nakao, Bunkyo-ku, JP;
Takeo Yamaguchi, Bunkyo-ku, JP;
Liang-yin Chu, Bunkyo-ku, JP;
Sang-hoon Park, Bunkyo-ku, JP;
Shin-ichi Nakao, Bunkyo-ku, JP;
Takeo Yamaguchi, Bunkyo-ku, JP;
Liang-Yin Chu, Bunkyo-ku, JP;
Sang-Hoon Park, Bunkyo-ku, JP;
Reika Kogyo Kabushiki Kaisha, Miyazaki, JP;
Abstract
At least one of a hollow particle, a porous particle, and a solid particlehaving the poreson the surface thereof is subjected to plasma irradiation under a reduced pressure while changing plasma irradiation intensity and/or the degree of vacuum. After the plasma irradiation, at least one type of monomer is graft polymerized onto the surface of the plasma irradiated particle by contact between the at least one type of monomer and the particle so as to substantially fill the pores, andof the particle with grafted polymersof the monomers.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile