The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2006
Filed:
Sep. 19, 2003
Applicants:
Yuji Horie, Tokyo, JP;
Hiromitsu Okuyama, Tokyo, JP;
Kazuei Yamaguchi, Tokyo, JP;
Inventors:
Assignee:
NIHON Microcoating Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/10 (2006.01); B24D 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A polishing cloth has a surface layer stacked over a base material. The surface layer is made of a foamed layer and a non-foamed layer, the foamed layer including air bubble cells and the non-foamed layer having an externally exposed surface where linear cuts are formed. These linear cuts reach the air bubble cells such that the air bubble cells communicate with the exterior through the linear cuts. These linear cuts are controlled to be 10 μm or less in length.
Horie, Yuji. (2006). Polishing cloth (U.S. Patent No. 7134952). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7134952
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile