The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2006
Filed:
Nov. 17, 2003
Jei-wei Chang, Cupertino, CA (US);
Chao-peng Chen, Fremont, CA (US);
Youfeng Zheng, San Jose, CA (US);
Jei-Wei Chang, Cupertino, CA (US);
Chao-Peng Chen, Fremont, CA (US);
Youfeng Zheng, San Jose, CA (US);
Headway Technologies, Inc., Milpitas, CA (US);
Abstract
Conventional liftoff processes used to define track width in magnetic read heads can produce an uneven etch-depth of dielectric materials around the sensor and cause shorting to the overlay top lead layer. This problem has been overcome by printing the images of track width and stripe height onto an intermediate layer to form a hard mask. Through this hard mask, the GMR stack can be selectively etched and then back-filled with a high-resistivity material by using newly developed electroless plating processes.