The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 07, 2006

Filed:

Aug. 17, 2000
Applicants:

Yi-min Wang, Bellevue, WA (US);

Wilf G. Russell, Redmond, WA (US);

Anish K. Arora, Columbus, OH (US);

Inventors:

Yi-Min Wang, Bellevue, WA (US);

Wilf G. Russell, Redmond, WA (US);

Anish K. Arora, Columbus, OH (US);

Assignee:

Microsoft Corporation, Redmond, WA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G05B 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Power line monitoring is disclosed. The monitoring can be performed in conjunction with an automation system designed to control and monitor devices and sensors. Model-based power line monitoring uses a model of acceptable power line activity. Activity that does not conform to the model is tagged as indicating a potential problem. Pattern-based power line monitoring uses patterns of unacceptable power line activity. Activity that matches one of the patterns is also tagged as indicating a potential problem.


Find Patent Forward Citations

Wang, Yi-Min. (2006). Pattern-and model-based power line monitoring (U.S. Patent No. 7133729). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7133729

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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