The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2006
Filed:
Jul. 14, 2005
Rolf Wartmann, Waake, DE;
Joerg Sprenger, Goettingen, DE;
Rolf Wartmann, Waake, DE;
Joerg Sprenger, Goettingen, DE;
Carl Zeiss Jena GmbH, Jena, DE;
Abstract
The invention is directed to an immersion microscope objective. This microscope objective contains four lens groups. The first lens group has a focal length of 2.6f–3.1f, where f is the total focal length of the microscope objective. The first lens group contains two lens components with a collecting effect. The first lens component has a focal length of 3f–4.5f. One of the lenses in the first lens component is made from a material with n greater than 1.72. A lens of the second lens component is made from a material with a partial dispersion of a first type. The second lens group with a focal length of 8f–10.2f comprises at least two lenses which are cemented together. A collecting lens is made from a material with a partial dispersion of the first type, and a diverging lens is made from a material with a partial dispersion of a second type. There follows a third lens group with a focal length greater than |25f|. The third lens group-times contains at least two lenses which are cemented together, one of which is a collecting lens made from a material with a fluor crown anomaly. Finally, there follows a fourth lens group with a focal length greater than |6⅔f| and comprising two meniscus-shaped lenses whose hollow surfaces face one another.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile