The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 07, 2006

Filed:

Apr. 14, 2004
Applicants:

Claude Chappert, Garches, FR;

Harry Bernas, Paris, FR;

Jacques Ferre, Verrieres-le-Buisson, FR;

Inventors:

Claude Chappert, Garches, FR;

Harry Bernas, Paris, FR;

Jacques Ferre, Verrieres-le-Buisson, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 5/00 (2006.01); G11B 11/10 (2006.01); H01F 41/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

Process for writing on a material, in which said material is irradiated by means of a beam of light ions, such as for example Heions, said beam of light ions having an energy of the order of or less than a hundred keV, wherein this material comprises a plurality of superposed thin-layers, at least one of said thin layers being magnetic and in that one or more regions having sizes of the order of 1 micrometer or less are irradiated, the irradiation dose being controlled so as to be a few 10ions/cmor less, the irradiation modifying the composition of atomic planes in the material at one or more interfaces between two layers of the latter.


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