The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2006
Filed:
Mar. 02, 2004
Etsuo Yamagishi, Osaka, JP;
Yukio Sato, Osaka, JP;
Taku Fukada, Osaka, JP;
Katsumi Takahashi, Osaka, JP;
Etsuo Yamagishi, Osaka, JP;
Yukio Sato, Osaka, JP;
Taku Fukada, Osaka, JP;
Katsumi Takahashi, Osaka, JP;
Pearl Kogyo Co., Ltd., Osaka, JP;
Abstract
This matching unit is used for a semiconductor plasma processing apparatus supplying high-frequency power via feeding line to an electrode provided in a chamber, and includes first and second variable capacitors, and a distributed constant circuit, which is structured by copper plates connected between an electrode of the second variable capacitor and an end of an internal conductor of the feeding line and the like. The distributed constant circuit and the feeding line delay the phase of a high-frequency voltage by ½ wavelength. Therefore, the same state as those when the electrode of the second variable capacitor and the electrode inside the chamber are directly connected can be realized, and matching is easily attained.