The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7131788 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 07, 2006

Filed:

Oct. 24, 2003
Applicants:

Peter J. Ianniello, Havre De Grace, MD (US);

Aigen Zhao, Clarksville, MD (US);

Gary L. Shaffer, Alexandria, VA (US);

Inventors:

Peter J. Ianniello, Havre De Grace, MD (US);

Aigen Zhao, Clarksville, MD (US);

Gary L. Shaffer, Alexandria, VA (US);

Assignee:

Advanced Geotech Systems, Baltimore, MD (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
E01C 3/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

A myriad of permutations of void-maintaining membrane laminates are provided. Laminates of the invention are particularly useful for providing high performance drainage within layered paved structures such as highways, airport runways and parking lots. Void-maintaining laminates of the invention comprise compression elements that are shaped, adapted and arranged to cooperate with base and upper layers such that superior flow capacities are attained through their void spaces, channels and paths, even under pressures in excess of 5,000 lbs per square inch.


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Ianniello, Peter. (2006). High-flow void-maintaining membrane laminates, grids and methods (U.S. Patent No. 7131788). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7131788

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