The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2006
Filed:
Jul. 07, 2004
Joseph D. Montalbo, Menlo Park, CA (US);
Joseph D. Montalbo, Menlo Park, CA (US);
National Semiconductor Corporation, Santa Clara, CA (US);
Abstract
A method for increasing a resolution and decreasing a power dissipation in an epiretinal implant device is described. The method includes positioning extendable microprobes to achieve mechanical contact with an anterior surface of the retina when the epiretinal implant device is activated. A level of pressure of the contact and an amount of current to be applied for stimulation of ganglion cells may be determined for optimum power consumption and stimulation. The contact of the microprobes with the retina, which may include MEMS, and an additional effect of mechanical stimulation enables reduction of current dissipation. Reduced current allows employment of more microprobes increasing resolution. The level of contact pressure and applied current may be dynamically re-determined based on changing ambient light conditions, and the like. A random duty-cycling of the mechanical contact and applied current may provide further reduction of current dissipation.