The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2006
Filed:
Dec. 01, 2004
Baining Guo, Bellevue, WA (US);
Stephen S. Lin, Haidian District, CN;
Heung-yeung Shum, Bellevue, WA (US);
Ying-qing Xu, Beijing, CN;
Yanyun Chen, Haidian District, CN;
Baining Guo, Bellevue, WA (US);
Stephen S. Lin, Haidian District, CN;
Heung-Yeung Shum, Bellevue, WA (US);
Ying-Qing Xu, Beijing, CN;
Yanyun Chen, Haidian District, CN;
Microsoft Corporation, Redwood, WA (US);
Abstract
A method and system for efficient synthesis of photorealistic free-form knitwear, where a single cross-section of yarn serves as the basic primitive for modeling entire articles of knitwear. This primitive, called the lumislice, describes radiance from a yarn cross-section based on fine-level interactions, including occlusion, shadowing, and multiple scattering, among yarn fibers. By representing yarn as a sequence of identical but rotated cross-sections, the lumislice can effectively propagate local microstructure over arbitrary stitch patterns and knitwear shapes. This framework accommodates varying levels of detail and capitalizes on hardware-assisted transparency blending. To further enhance realism, a technique for generating soft shadows from yarn is also introduced.