The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 31, 2006

Filed:

Nov. 06, 2003
Applicants:

Robert H. Webb, Lincoln, MA (US);

Clara E. Dimas, Malden, MA (US);

Inventors:

Robert H. Webb, Lincoln, MA (US);

Clara E. Dimas, Malden, MA (US);

Assignee:

Boston Micromachines Corporation, Watertown, MA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01J 1/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and method modifying wavefront shape is provided. Generally, the system contains a wavefront shape modifying device for modifying the shape of the wavefront. The system also contains a series of optical devices for returning the modified wavefront to the wavefront modifying device with an orientation that enables further modification of the modified wavefront by the wavefront modifying device. The method contains the steps of: reflecting a wavefront from a surface of a wavefront shape modifying device, resulting in the wavefront having a modified shape; and reflecting the wavefront having a modified shape from the surface of the wavefront shape modifying device a second time resulting in a final wavefront having a shape that has been modified twice.


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