The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2006
Filed:
Aug. 31, 2004
Robert L Maier, Ontario, NY (US);
Jue Wang, Fairport, NY (US);
Robert L Maier, Ontario, NY (US);
Jue Wang, Fairport, NY (US);
Corning Incorporated, Corning, NY (US);
Abstract
The invention is directed to improved coated metal fluoride single crystal optical elements suitable for use in below 250 nm optical lithography, and particularly below 200 nm lithography. The coated elements of the invention can be lenses, windows, prisms and other elements used in lithographic methods, including the laser sources used therein. The invention is also directed to a method of removing the quasi-Bielby layer formed when a shaped optical element is polished. Removal of the quasi-Bielby layer prior to coating results in improved durability and optical transmission characteristics of the coated lenses. The coating material can be any material that does not impede the transmission of below 250 nm electromagnetic radiation. Fluorine doped silicon dioxide is the preferred coating material.