The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 31, 2006

Filed:

Jun. 30, 2003
Applicants:

Thomas Edward Dinan, San Jose, CA (US);

Richard Hsiao, San Jose, CA (US);

Inventors:

Thomas Edward Dinan, San Jose, CA (US);

Richard Hsiao, San Jose, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/187 (2006.01); C25D 5/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

The magnetic head includes a Ppole tip in which the Ppole tip material is electroplated upon a sidewall of the Ppole tip photolithographic trench. To accomplish this, a block of material is deposited upon a write gap layer, such that a generally straight, vertical sidewall of the block of material is disposed at the Ppole tip location. Thereafter, an electroplating seed layer is deposited upon the sidewall. A Ppole tip trench is photolithographically fabricated such that the sidewall (with its deposited seed layer) is exposed within the Ppole tip trench. Thereafter, the Ppole tip is formed by electroplating pole tip material upon the seed layer and outward from the sidewall within the trench. The width of the Ppole tip is thus determined by the quantity of pole tip material that is deposited upon the sidewall.


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