The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2006
Filed:
Apr. 17, 2003
John Jensen, Portland, OR (US);
John Jensen, Portland, OR (US);
LSI Logic Corporation, Milpitas, CA (US);
Abstract
A method of making a reticle. Design data, i.e., GDSII data is read in, then a scribe or frame is built, and the design is placed in the scribe. Then, Boolean operations, sizing, OPC corrections and phase shifting are performed, as needed, perhaps using third party tools. Then, the GDS data is sorted, and a new GDS hierarchy is created where each mask layer can be generated as one mask making pattern, i.e., new cells are created representing each masking image location on the reticle, each new cell is placed in a topcell, then a gds2 file is produced where the gds2 file can be used to create a reticle or can be used to create reticle making data.