The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2006

Filed:

Oct. 14, 2003
Applicants:

Jiang-jen Lin, Taichung, TW;

Chien-chia Chu, Taichung, TW;

Inventors:

Jiang-Jen Lin, Taichung, TW;

Chien-Chia Chu, Taichung, TW;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08K 9/06 (2006.01); C08K 3/34 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to an exfoliating agent and to a process for producing random form of nanoscale silicate plates. Two types of exfoliating agents are applied in the present invention, which respectively have the formula: wherein R is a polyoxybutylene group, polyoxypropylene group, poly(oxyethylene/oxypropylene) group, or polyoxyethylene group. In this invention, layered silicate clays are exfoliated into random silicate plates by acidifying AMO or AEO with inorganic acid, adding the acidified AMO or AEO to layered silicate clay with agitation, and adding sodium hydroxide or chloride of alkali metal or alkaline-earth metal, in ethanol, water and a hydrophobic organic solvent to the intermediate product and repeating phase separation procedures to isolate random silicate plates from water phase.


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