The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2006
Filed:
Sep. 11, 2002
Applicants:
Eiji Satou, Kanagawa, JP;
Makoto Kaneko, Kanagawa, JP;
Naoshi Murata, Hiroshima, JP;
Inventors:
Assignee:
Mitsubishi Rayon Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C07P 17/04 (2006.01); C07P 17/06 (2006.01);
U.S. Cl.
CPC ...
Abstract
A process for producing a monomer for resists represented by the following general formula 1:
Satou, Eiji. (2006). Process for producing monomer (U.S. Patent No. 7125692). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7125692
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile