The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2006
Filed:
Jun. 07, 2005
Mitsuru Kitamura, Tokyo, JP;
Tomohisa Hamano, Tokyo, JP;
Mitsuru Kitamura, Tokyo, JP;
Tomohisa Hamano, Tokyo, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
The invention relates to a computer-generated hologram fabrication process that can reduce loads on computation of interference fringes for an original image including micro-characters. A visually perceivable original imageand a visually unperceivable original image(micro-characters) are defined, and sample point sources of light P are defined at a low density on the original imageand at a high density on the original image. Interference fringes of object light coming from the point light sources on the original imageand reference light R are found on each computation point within an area αon a recording surface, and interference fringes of object light coming from point light sources on the original imageand reference light R are found on each computation point within an area αon the recording surface. The light sources that become samples are defined at a given pitch on sectional lines obtained by cutting the original imagesandby a multiplicity of sections (parallel with an XZ plane) located at a given spacing. The section-to-section spacing for the original imageis made narrows than that for the original image